Facilities
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In addition to the in-house capabilities listed above, the research program at LINS also leverages access to the following major research infrastructure at both, UIC and beyond.
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The Electron Microscopy Core (EMC) is a central facility offering access to instrumentation, training, and service using scanning (SEM), transmission (TEM) and scanning transmission (STEM) electron microscopy, surface analysis (XPS) and vibrational spectroscopy (Raman). The EMC mission is to provide cost-effective, safe and efficient access to state-of-the-art and core electron microscopy imaging and analytical characterization, and also surface analysis by XPS or Raman, with 24/7 access for the UIC community and beyond. In addition to instrument access, EMC staff offer advice, hands-on training, education and research collaboration. EMC aims to promote, enable, and encourage cutting-edge education and research using the core’s instrumentation.
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Through approved user projects, LINS researchers have established access to research infrastructure at the Center for Nanoscale Materials (CNM), a U.S. Department of Energy (DOE) user facility at Argonne National Laboratory, including:
- State-of-the-art nanofabrication cleanroom
- Advanced computational infrastructure for DFT and MD simulations
The CNM is a premier user facility providing expertise, instrumentation and infrastructure for interdisciplinary nanoscience and nanotechnology research. Use of the CNM is supported by the DOE Office of Science, Office of Basic Energy Sciences, under Contract No. DE-AC02-06CH11357.
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The UIC Nanotechnology Core Facility (NCF) is a versatile MEMS/Nano facility, which is accessible to University, non-profit and industrial researchers. The NCF enables research by providing access, training, service and process guidance on fabrication and characterization equipment. As a research and development laboratory, the NCF is dedicated to application of integrated circuit and fiber optic technology to improve manufacturing methods for MEMS/Nano devices, BioMEMS, Microfluidic, Electromechanical, Mechanical, Chemical, Optical, Photonic and multi-functional devices, some of which have previously been built by more traditional techniques. The NCF has versatile equipment for: Photolithography (Mask Making capabilities, Mid/Deep-UV, top & bottom alignment), Fabrication (DRIE for Silicon & Silica, RIE, PECVD Oxidation/ Diffusion, LPCVD, RTP, Bulk and Surface Micromachining, Sputtering and E-beam metal evaporation, Polymer deposition and processing), Metrology (AFM, Optical & Contact Profilometry, Optical Inspection, High speed camera, Thin Film Stress Measurement), and Back-end processing (Dicing, Lead attachment and die bonding).